Skip to Main Content (Press Enter)

Logo UNIMORE
  • ×
  • Home
  • Corsi
  • Insegnamenti
  • Professioni
  • Persone
  • Pubblicazioni
  • Strutture
  • Terza Missione
  • Attività
  • Competenze

UNI-FIND
Logo UNIMORE

|

UNI-FIND

unimore.it
  • ×
  • Home
  • Corsi
  • Insegnamenti
  • Professioni
  • Persone
  • Pubblicazioni
  • Strutture
  • Terza Missione
  • Attività
  • Competenze
  1. Pubblicazioni

Investigation of the plasmon excitation on heavily doped p-type GaAs(110) surface.

Articolo
Data di Pubblicazione:
1992
Citazione:
Investigation of the plasmon excitation on heavily doped p-type GaAs(110) surface / Del Pennino, Umberto; Biagi, Roberto; Mariani, Carlo. - In: APPLIED SURFACE SCIENCE. - ISSN 0169-4332. - STAMPA. - 56-58:(1992), pp. 44-49. [10.1016/0169-4332(92)90213-H]
Abstract:
We present high-resolution electron energy loss measurements on heavily doped p-type GaAs(110), exploiting a wide range of primary beam energies (E(p)). The spectra are remarkably different from those relative to the n-type samples, presenting very broad features and a large background up to several hundreds of meV. The use of different E(p) demonstrated the presence of an intrinsic dead layer at the clean semiconductor surface. We could fit the spectra by means of the three-layer model, obtaining a very good agreement. In particular, from the reproduced broad structure we deduced a large value for the plasmon damping, whose origin is discussed and related to the mobility.
Tipologia CRIS:
Articolo su rivista
Keywords:
free-carrier plasmon; p-type; holes; HREELS; plasmon damping
Elenco autori:
Del Pennino, Umberto; Biagi, Roberto; Mariani, Carlo
Autori di Ateneo:
BIAGI Roberto
Link alla scheda completa:
https://iris.unimore.it/handle/11380/11693
Pubblicato in:
APPLIED SURFACE SCIENCE
Journal
  • Utilizzo dei cookie

Realizzato con VIVO | Designed by Cineca | 26.5.0.0