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Effects of constant voltage stress on p- and n-type organic thin film transistors with poly(methyl methacrylate) gate dielectric

Articolo
Data di Pubblicazione:
2013
Citazione:
Effects of constant voltage stress on p- and n-type organic thin film transistors with poly(methyl methacrylate) gate dielectric / Wrachien, N; Cester, A; Bari, D; Capelli, R; D’Alpaos, R; Muccini, M; Stefani, A; Turatti, G; Meneghesso, G. - In: MICROELECTRONICS RELIABILITY. - ISSN 0026-2714. - 53:9-11(2013), pp. 1798-1803. [10.1016/j.microrel.2013.07.085]
Abstract:
We performed constant voltage stress on oligothiophene-based p- and n-type organic thin-film-transistors, in the accumulation regime. The stress induced charge trapping, mobility degradation and defect generation. The specific kinetics depends not only on the applied bias value and polarity, but also on the semiconductor type. Stress on PMMA capacitors (without the semiconductor film) revealed that most of the degradation is largely originated by the interaction with the semiconductor layer, which enhances charge injection
Tipologia CRIS:
Articolo su rivista
Keywords:
organic transistor; voltage stress; gate dielectric
Elenco autori:
Wrachien, N; Cester, A; Bari, D; Capelli, R; D’Alpaos, R; Muccini, M; Stefani, A; Turatti, G; Meneghesso, G
Autori di Ateneo:
CAPELLI Raffaella
Link alla scheda completa:
https://iris.unimore.it/handle/11380/1176673
Pubblicato in:
MICROELECTRONICS RELIABILITY
Journal
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