Are high resolution resistometric methods really useful for early detection of electromigration damage?
Articolo
Data di Pubblicazione:
1997
Citazione:
Are high resolution resistometric methods really useful for early detection of electromigration damage? / A., Scorzoni; S., Franceschini; R., Balboni; M., Impronta; I., De Munari; Fantini, Fausto. - In: MICROELECTRONICS RELIABILITY. - ISSN 0026-2714. - STAMPA. - 37:(1997), pp. 1479-1482. [10.1016/S0026-2714(97)00090-3]
Abstract:
In this paper the use of High Resolution Resistometric Techniques for early detection of electromigration strength of Al-Cu/TiN/Ti stripes is analyzed.
Tipologia CRIS:
Articolo su rivista
Keywords:
Resistometric measurement.
Electromigration.
Elenco autori:
A., Scorzoni; S., Franceschini; R., Balboni; M., Impronta; I., De Munari; Fantini, Fausto
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