Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods
Articolo
Data di Pubblicazione:
2020
Citazione:
Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods / Xia, A.; Togni, A.; Hirn, S.; Bolelli, G.; Lusvarghi, L.; Franz, R.. - In: SURFACE & COATINGS TECHNOLOGY. - ISSN 0257-8972. - 385:(2020), pp. 1-8. [10.1016/j.surfcoat.2020.125356]
Abstract:
Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.
Tipologia CRIS:
Articolo su rivista
Keywords:
Angular deposition; Arc evaporation; High entropy alloy; High power impulse magnetron sputtering; Magnetron sputter deposition; Refractory metals
Elenco autori:
Xia, A.; Togni, A.; Hirn, S.; Bolelli, G.; Lusvarghi, L.; Franz, R.
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