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On the interpretation of MOS impedance data in both series and parallel circuit topologies

Articolo
Data di Pubblicazione:
2021
Citazione:
On the interpretation of MOS impedance data in both series and parallel circuit topologies / Caruso, E.; Lin, J.; Monaghan, S.; Cherkaoui, K.; Floyd, L.; Gity, F.; Palestri, P.; Esseni, D.; Selmi, L.; Hurley, P. K.. - In: SOLID-STATE ELECTRONICS. - ISSN 0038-1101. - 185:(2021), pp. 108098-108099. [10.1016/j.sse.2021.108098]
Abstract:
We investigate the interplay between the series (S) and parallel (P) equivalent circuit representations of the MOS system conductance (G) and capacitance (C) in inversion. Experimental and simulated data for Si and InGaAs MOSCAPs are firstly analyzed mathematically. It is found that by interpreting the measured data in both the series and parallel mode, five independent values are obtained for the magnitude and frequency of the maxima and minima points of the −ωdCS,P/dω and GS,P/ω functions versus angular frequency (ω). The significance and application of the approach is presented and discussed.
Tipologia CRIS:
Articolo su rivista
Keywords:
Doping; Impedance spectroscopy; Minority carrier lifetime; MOS characterization; Oxide thickness; Parameter extraction; TCAD
Elenco autori:
Caruso, E.; Lin, J.; Monaghan, S.; Cherkaoui, K.; Floyd, L.; Gity, F.; Palestri, P.; Esseni, D.; Selmi, L.; Hurley, P. K.
Autori di Ateneo:
PALESTRI Pierpaolo
SELMI LUCA
Link alla scheda completa:
https://iris.unimore.it/handle/11380/1248858
Pubblicato in:
SOLID-STATE ELECTRONICS
Journal
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