A study of the electromagnetic-fluctuation-induced forces on thin metallic films

Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced force of a free standing metallic film in vacuum as a function of the film size and plasma frequency. If the film is deposited onto a substrate or interacts with a plate, both the sign and the value of the force are modified. Il is shown that the force can change sign from attractice to repulsive upon changing the substrate plasma frequency.