NROM™ - A new non-volatile memory technology: From device to products
Contributo in Atti di convegno
Data di Pubblicazione:
2001
Citazione:
NROM™ - A new non-volatile memory technology: From device to products / I., Bloom; Pavan, Paolo; B., Eitan. - In: MICROELECTRONIC ENGINEERING. - ISSN 0167-9317. - STAMPA. - 59:1-4(2001), pp. 213-224. ( 12th Biannual Conference on Insulating Films on Semi-Conductors (INFOS 2001) Udine, ita June 20-23, 2001) [10.1016/S0167-9317(01)00625-6].
Abstract:
NROM™ — a new NVM technology has recently been introduced, enabling three major improvements relative to the floating gate technology: one technology for all NVM products (Flash, EEPROM, ROM and Embedded), higher density (2.5F2 per bit in flash) and simple process with reduced number of masks without any exotic materials. The NROM™ cell is based on localized charge trapping above the junction edge, enabling physically separated two bits per cell. Performance of new NVM NROM™ based products show endurance up to 100 K with retention of 10 years at 150°C.
Tipologia CRIS:
Relazione in Atti di Convegno
Keywords:
semiconductor memories; nonvolatile memories; silicon nitride
Elenco autori:
I., Bloom; Pavan, Paolo; B., Eitan
Link alla scheda completa:
Titolo del libro:
INFOS 2011 Conference Proceedings
Pubblicato in: