Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films
Articolo
Data di Pubblicazione:
2009
Citazione:
Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films / M., Massi; M., Cavallini; Biscarini, Fabio. - In: SURFACE SCIENCE. - ISSN 0039-6028. - ELETTRONICO. - 603:3(2009), pp. 503-506. [10.1016/j.susc.2008.12.012]
Abstract:
The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(Ill) (Alq(3)) Onto Si/SiOx Surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq(3) films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate
Tipologia CRIS:
Articolo su rivista
Keywords:
rid assisted deposition, Self-organization, Unconventional lithography, SINGLE-MOLECULE MAGNETS, CONJUGATED POLYMERS, GROWTH-MORPHOLOGY, SURFACE, FABRICATION, PATTERNS, MICROSTRUCTURES, PENTACENE, ARRAYS
Elenco autori:
M., Massi; M., Cavallini; Biscarini, Fabio
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