Data di Pubblicazione:
1989
Citazione:
On the validity of resistometric technique in electromigration studies of narrow stripes / Fantini, Fausto; G., Specchiulli; C., Caprile. - In: THIN SOLID FILMS. - ISSN 0040-6090. - STAMPA. - 72:(1989), pp. L85-L89. [10.1016/0040-6090(89)90658-5]
Abstract:
In the framework of the development of a submicron CMOS technology, we investigate the reliability of Al stripes 1.5-8 micron wide and compared the results obtained with various techniques; in particular in this paper the resistometric method is compared with the standard MYF technique for the narrowest stripes.
Tipologia CRIS:
Articolo su rivista
Keywords:
Electromigration.
Resistometric techniques.
Sputtered Al-1% Si.
Elenco autori:
Fantini, Fausto; G., Specchiulli; C., Caprile
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