Fabrication method at micrometer- and nanometer- scales for generation and control of anisotropy of structural, electrical, optical and optoelectronic properties of thin films of conjugated materials
Patent
Publication Date:
2001
Short description:
Fabrication method at micrometer- and nanometer- scales for generation and control of anisotropy of structural, electrical, optical and optoelectronic properties of thin films of conjugated materials / Murgia, Mauro; Mei, Paolo; Biscarini, Fabio; Taliani, Carlo.
abstract:
A non-conventional lithographic process for modifying, improving and fabricating structural anisotropy, organization and order, and anisotropy of the mechanical, electrical, optical, optoelectronics, charge-carrying and energy-carrying properties in thin films constituted by organic materials with double conjugated bonds. The method consists in molding, performed directly on the conjugated thin film by virtue of intimate contact with the surface of a mold. The parts of the film in direct contact with the mold undergo a transformation that is local in character and whose dimensions depend on the dimensions of the structures provided on the mold. Molding can be performed both in static conditions and in dynamic conditions.
Iris type:
Brevetto
Keywords:
Nanoimprinting Lithography, organic semiconductors, polarized emission
List of contributors: