Deuterium Effect on Interface States and SILC Generation in the CHE Stress Conditions: A Comparative Study
Contributo in Atti di convegno
Data di Pubblicazione:
2000
Citazione:
Deuterium Effect on Interface States and SILC Generation in the CHE Stress Conditions: A Comparative Study / Esseni, David; Bude, J.; Selmi, Luca. - (2000), pp. 339-342. ( IEEE International Electron Devices Meeting (IEDM) SAN FRANCISCO, CA DEC 10-13, 2000) [10.1109/IEDM.2000.904325].
Abstract:
This paper investigates the generation of interface states (N/sub it/) and stress induced leakage current (SILC) in the stress regime of channel hot electrons (CHE) and the possible beneficial effect of deuterium annealing. Our results show that no isotope effect is observed on SILC even when a large isotope effect is simultaneously observed on N/sub it/. The generation of SILC seems to be always correlated to hot holes injection (HHI) whereas two different generation mechanisms for N/sub it/ can be identified.
Tipologia CRIS:
Relazione in Atti di Convegno
Elenco autori:
Esseni, David; Bude, J.; Selmi, Luca
Link alla scheda completa:
Titolo del libro:
INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST
Pubblicato in: