Simulation study of the on-current improvements in Ge and sGe versus Si and sSi nano-MOSFETs

This paper employs a state-of-the-art semi-classical transport model for inversion layers to analyze the Ion in Si, sSi, Ge and sGe n- and p-MOSFETs by accounting for all the relevant scattering mechanisms (including the remote surface-optical phonons (SOph) and remote Coulomb scattering (remQ) related to high-κ dielectrics), in which strain is implicitly introduced by a modification of the band structure. Our models are first validated against experiments for both mobility and IDS in nanoscale transistors. Then the Ion in Ge and Si MOSFETs is compared for different crystal orientations and strain conditions.