Role of interface region on the optoelectronic properties of silicon nanocrystals embedded in SiO2

Light emitting silicon nanocrystals embedded in SiO2 have been investigated by x-ray absorption measurements in total electron and photoluminescence yields, by energy filtered TEM analysis and by ab-initio total energy calculations. Both experimental and theoretical results show that the interface between the silicon nanocrystals and the surrounding SiO2 is not sharp: an intermediate region of amorphous nature and of variable composition links the crystalline Si with the amorphous stoichiometric SiO2. This region plays an active role in the light emission process.