Organic ice resist for 2D and 3D patterns by electron beam and extreme ultra violet lithography

Patent
Publication Date:
2016
Short description:
Organic ice resist for 2D and 3D patterns by electron beam and extreme ultra violet lithography / Han, A; Tiddi, W; Beleggia, M.
Iris type:
Brevetto
List of contributors:
Authors of the University:
Handle:
https://iris.unimore.it/handle/11380/1255383