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Substrate roughness influence on the order of nanografted Self-Assembled Monolayers

Articolo
Data di Pubblicazione:
2022
Citazione:
Substrate roughness influence on the order of nanografted Self-Assembled Monolayers / Scaini, D.; Biscarini, F.; Casalis, L.; Albonetti, C.. - In: CHEMICAL PHYSICS LETTERS. - ISSN 0009-2614. - 803:(2022), pp. N/A-N/A. [10.1016/j.cplett.2022.139819]
Abstract:
Adjacent patches of alkanethiol molecules whose chain lengths range from 11 to 15 carbon atoms are fabricated by nanografting within a Self-Assembled Monolayer matrix. Atomic Force Microscopy and Electrostatic Force Microscopy are employed to investigate their structural and electronic properties, highlighting the key role of the substrate roughness. In particular, the topographic phase signal allows to establish an odd–even dependence of the local stiffness versus the alkyl chain length, while the electrostatic force signal provides evidence that the conformational order versus the alkyl chain length follows an asymmetric parabolic trend induced by the substrate roughness.
Tipologia CRIS:
Articolo su rivista
Keywords:
Alkanethiols; Atomic force microscopy; Electrostatic force microscopy; Nanografting; Self-assembly monolayer
Elenco autori:
Scaini, D.; Biscarini, F.; Casalis, L.; Albonetti, C.
Autori di Ateneo:
BISCARINI FABIO
Link alla scheda completa:
https://iris.unimore.it/handle/11380/1288120
Pubblicato in:
CHEMICAL PHYSICS LETTERS
Journal
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