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  1. Pubblicazioni

Impurity screening in silicon nanocrystals

Articolo
Data di Pubblicazione:
2009
Citazione:
Impurity screening in silicon nanocrystals / F., Trani; D., Ninno; G., Cantele; Degoli, Elena; Ossicini, Stefano. - In: PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. - ISSN 1386-9477. - STAMPA. - 41:6(2009), pp. 966-968. [10.1016/j.physe.2008.08.028]
Abstract:
The impurity screening in silicon nanocrystals is analyzed using a first-principles approach based on density functional theory. The electron density induced by a positively charged impurity is evaluated as a function of the nanocrystal size. From our calculations we found that the impurity is responsible for anelectron density accumulation around the impurity site, fully compensated by a positive charge accumulation at the surface(electron depletion). The results are sound and shed new light on the most recent findings in this field. On the basis of the present first-principles results, we propose a Thomas–Fermi model of the impurity screening in silicon nanocrystals. The model gives reliableestimations of the screening function, that well compares to recent ab-initio calculations.
Tipologia CRIS:
Articolo su rivista
Keywords:
Silicon nanocrystals; Doped nanocrystals; Screening
Elenco autori:
F., Trani; D., Ninno; G., Cantele; Degoli, Elena; Ossicini, Stefano
Autori di Ateneo:
DEGOLI Elena
OSSICINI Stefano
Link alla scheda completa:
https://iris.unimore.it/handle/11380/615117
Pubblicato in:
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES
Journal
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