Data di Pubblicazione:
2024
Citazione:
Hemt device having an improved gate structure and manufacturing process thereof / Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina. - (2024 Mar 21).
Abstract:
The HEMT device has a body including a heterostructure configured to generate a 2-dimensional charge-carrier gas; and a gate structure which extends on a top surface of the body and is biasable to electrically control the 2-dimensional charge-carrier gas. The gate structure has a channel modulating region of semiconductor material; a functional region of semiconductor material; and a gate contact region of conductive material. The functional region and the gate contact region extend on a top surface of the channel modulating region and the gate contact region is arranged laterally with respect to the functional region. The channel modulating region has a different conductivity type with respect to the functional region.
Tipologia CRIS:
Brevetto
Keywords:
HEMT, Power FET, WBG Semiconductors
Elenco autori:
Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina
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