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  1. Research Outputs

Hemt device having an improved gate structure and manufacturing process thereof

Patent
Publication Date:
2024
Short description:
Hemt device having an improved gate structure and manufacturing process thereof / Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina. - (2024 Mar 21).
abstract:
The HEMT device has a body including a heterostructure configured to generate a 2-dimensional charge-carrier gas; and a gate structure which extends on a top surface of the body and is biasable to electrically control the 2-dimensional charge-carrier gas. The gate structure has a channel modulating region of semiconductor material; a functional region of semiconductor material; and a gate contact region of conductive material. The functional region and the gate contact region extend on a top surface of the channel modulating region and the gate contact region is arranged laterally with respect to the functional region. The channel modulating region has a different conductivity type with respect to the functional region.
Iris type:
Brevetto
Keywords:
HEMT, Power FET, WBG Semiconductors
List of contributors:
Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina
Authors of the University:
CHINI Alessandro
Handle:
https://iris.unimore.it/handle/11380/1400046
Full Text:
https://iris.unimore.it//retrieve/handle/11380/1400046/961099/US20240332413A1.pdf
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