Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices
Contributo in Atti di convegno
Data di Pubblicazione:
2011
Citazione:
Comprehensive physical modeling of forming and switching operations in HfO2 RRAM devices / Vandelli, Luca; Padovani, Andrea; Larcher, Luca; G., Broglia; G., Ori; Montorsi, Monia; G., Bersuker; Pavan, Paolo. - ELETTRONICO. - 1:(2011), pp. 17.5.1-17.5.4. ( 2011 IEEE International Electron Devices Meeting, IEDM 2011 Washington, DC, usa 5-7 December 2011) [10.1109/IEDM.2011.6131574].
Abstract:
In this work we apply a physical model based on charge transport and molecular mechanics/dynamics simulations to investigate the physical mechanisms governing the RRAM forming and switching operations. The proposed model identifies the major driving forces controlling conductive filament (CF) formation and changes during RRAM switching, thus providing a tool for investigation and optimization of RRAM devices.
Tipologia CRIS:
Relazione in Atti di Convegno
Keywords:
RRAM; modeling; forming
Elenco autori:
Vandelli, Luca; Padovani, Andrea; Larcher, Luca; G., Broglia; G., Ori; Montorsi, Monia; G., Bersuker; Pavan, Paolo
Link alla scheda completa:
Titolo del libro:
Proc. IEDM
Pubblicato in: